| 1. | Q. |
Does photoresist have an affect on wafer charging? |
| A. |
Definitely. The presence of photoresist on the surface of the wafer significantly increases wafer charging, as discussed in the following paper:
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| 2. | Q. |
How significant are patterning topography-dependent charging effects? |
| A. |
Patterning topography-dependent charging effects can be very significant. In some cases, topography-dependent charging effects are the dominant effects.
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| 3. | Q. |
Can I use CHARM®-2 wafers to study patterning topography-dependent charging effects, such as the "electron shading" effect? |
| A. |
Yes. This is done by placing resist patterns over the CHARM®-2 "antennas" to emulate the conditions that exist on product wafers.
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| 4. | Q. |
How can I study topography-dependent charging effects associated with my specific design rules? |
| A. |
You can have WCM design custom resist masks for you.
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Wafer Charging Monitors, Inc.