Re-usable CHARM®-2 wafers in 200mm, 150mm, 125mm, 100mm, and 75mm sizes. These sizes are available now. Please contact WCM for delivery information and/or for instructions on how to evaluate 300 mm equipment for wafer charging.
CHARM®-2 wafer testing on Agilent (HP) and Keithley testers. On-site testing of CHARM®-2 wafers is available on Agilent (HP) and Keithley Instruments parametric testers, allowing process equipment evaluation in less than one hour.
ChargeMap® software for automated, on-site analysis of CHARM®-2 data. The ChargeMap® data analysis and display software complements the test software from Agilent (HP) and Keithley Instruments to allow automated, on-site analysis of CHARM®-2 data. ChargeMap® runs on Windows-equipped PCs, is very easy to use, and may be configured for engineering or production environments.
DamageMap. A ChargeMap® enhancement, the DamageMap wafer map shows the current density forced into the gate oxide -- the real cause of charging damage. DamageMap summarizes the CHARM®-2 results in one simple wafer map, which may be compared directly to product yield wafer maps to determine the equipment responsible for charging damage. No other charging monitor provides this capability.
CHARM®-2 applications assistance. CHARM®-2 wafers are used to measure the UV dose and charging performance of ion implanters, resist ashers, silicon etchers, metal etchers, oxide etchers, sputter clean and metal deposition systems, oxide deposition systems, and spray rinsers. We will provide you with the applications know-how.
Charging problems trouble-shooting assistance. Identifying the process equipment responsible for charging damage is a simple task with CHARM®-2. Let us help you do it.
Equipment & process evaluation services. This is the easiest way to get acquainted with CHARM®-2. All you do is put the CHARM®-2 wafer in the process chamber -- and we do the rest. We will provide you with a report which includes wafer maps of wafer surface-substrate potentials, UV dose, and J-V characteristics of the charging source and we will show you how to use them to predict device damage for any gate oxide thickness. Or you may request DamageMap wafer maps specific to your gate oxide.
Resist masks for CHARM®-2 wafers. Resist patterns can affect wafer charging and the effect is different depending on whether a light-field or dark-field mask is being used. Useful information about resist-mediated charging may be obtained using your own product masks. We can tell you how.
Special projects. If you have special needs that require tools or services not mentioned here, please discuss them with us. We regularly engage in collaborative developments to satisfy the needs of our customers.
Success stories. We have hundreds of satisfied clients at more than 100 companies worldwide spanning the wafer processing equipment, integrated ciruit/systems, and disk-drive read-head manufacturing industries.