WCM   Wafer Charging Monitors, Inc.

Latest Research!

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1.  How to Avoid Charging Damage in IC Manufacturing
2. Investigation of Electron-Shading Effects during High-Current Ion Implants
3. Charging on Resist-Patterned Wafers During High-Current Ion Implants
4. Use of EEPROM-based Sensors in Investigating Physical Mechanisms Responsible for Charging Damage
5. Utility of CHARM-2 in Diagnosing Sources of Plasma Charging Damage in High Density Etchers . . .
6. Impact of F Species on Plasma Charge Damage in a RF Asher
7. Mechanism of Charge Induced Plasma Damage to EPROM Cells During Fabrication of Integrated Circuits
8. Electron Shading Effects During Oxide Etching in Uniform and Non-Uniform Plasmas

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